GPSZWBG01A
Maskless Lithography Machine
Laser Processing Equipment
Maskless Lithography Machine
Model:GPSZWBG01A
Product Overview
Laser direct-write lithography system for micro-nano fabrication. Uses maskless technology to enable flexible pattern writing, ideal for small-batch, high-mix micro-nano structure manufacturing.
Application Areas
- Micro-Nano Structure Fabrication
- Semiconductor devices
- MEMS devices
- Photolithography
- Direct Image Printing
Technical Specifications
| Resolution | nanometer-level |
| Processing width | Customizable |
| Light Source | UV Laser |
| Processing Method | Laser Direct-Write Lithography |
| Mask | Maskless |
FAQ
Q1.What is the resolution of maskless lithography machine GPSZWBG01A?
Maskless lithography uses laser direct writing to achieve sub-micron resolution, enabling direct patterning of micro/nano structures without masks. Ideal for rapid prototyping and low-volume production.
Q2.Which application scenarios are suitable for maskless lithography?
Ideal for R&D and small-batch production in micro/nano-structure fabrication, diffractive optical elements, microfluidic chips, photonic crystals, and MEMS devices. Perfect for scenarios requiring rapid iteration.
Q3.What is the difference between maskless lithography and mask-based lithography?
Maskless lithography writes patterns directly from CAD data without expensive masks, offering high flexibility, low cost, and short cycle times—ideal for R&D and small-batch production. Masked lithography is suited for high-volume manufacturing.
Q4.What base materials does GPSZWBG01A support?
Supports silicon wafers, glass, quartz, ITO glass, flexible substrates, and more. Compatible with various photoresists to meet diverse micro- and nanofabrication needs.
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